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Implant Abutment Cleaning by Plasma of Argon: 5â Year Followâ Up of a Randomized Controlled Trial
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Implant Abutment Cleaning by Plasma of Argon: 5â Year Followâ Up of a Randomized Controlled Trial
Canullo, Luigi; Tallarico, Marco; Peñarrocha‐oltra, David; Monje, Alberto; Wang, Hom‐lay; Peñarrocha‐diago, Miguel
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http://localhost:8080/xmlui/handle/CUHPOERS/101655
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Peer Reviewed
https://deepblue.lib.umich.edu/bitstream/2027.42/142177/1/jper0434.pdf
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