Sangam: A Confluence of Knowledge Streams

10 nm gap bowtie plasmonic apertures fabricated by modified lift-off process

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dc.contributor Massachusetts Institute of Technology. Department of Chemistry
dc.contributor Jensen, Russell Andrew
dc.contributor Bawendi, Moungi G
dc.creator Huang, I-Chun
dc.creator Holzgrafe, Jeffrey
dc.creator Choy, Jennifer T.
dc.creator Lončar, Marko
dc.creator Jensen, Russell Andrew
dc.creator Bawendi, Moungi G
dc.date 2018-01-30T15:47:33Z
dc.date 2018-01-30T15:47:33Z
dc.date 2016-09
dc.date 2016-06
dc.date.accessioned 2023-03-01T18:10:40Z
dc.date.available 2023-03-01T18:10:40Z
dc.identifier 0003-6951
dc.identifier 1077-3118
dc.identifier http://hdl.handle.net/1721.1/113345
dc.identifier Huang, I. Chun, et al. “10 Nm Gap Bowtie Plasmonic Apertures Fabricated by Modified Lift-off Process.” Applied Physics Letters, vol. 109, no. 13, Sept. 2016, p. 133105. © 2016 AIP Publishing LLC
dc.identifier https://orcid.org/0000-0003-2220-4365
dc.identifier.uri http://localhost:8080/xmlui/handle/CUHPOERS/279042
dc.description Bowtie plasmonic apertures, with gap sizes down to 11 nm and silver film thickness of up to 150 nm (aspect ratio 14:1), were fabricated on a silicon nitride membrane. Transmission spectra feature the aperture resonances ranging from 470 to 687 nm, with quality factors around 10. The mode area of the smallest gap aperture is estimated to be as small as 0.002 (k/n)[superscript 2] using numerical modeling. Importantly, our fabrication technique, based on an e-beam lithography and a lift-off process, is scalable which allows fabrication of many devices in parallel over a relatively large area. We believe that the devices demonstrated in this work will find application in studying and engineering light-matter interactions.
dc.format application/pdf
dc.language en_US
dc.publisher American Institute of Physics (AIP)
dc.relation https://doi.org/10.1063/1.4963689
dc.relation Applied Physics Letters
dc.rights Article is made available in accordance with the publisher's policy and may be subject to US copyright law. Please refer to the publisher's site for terms of use.
dc.source Other univ. web domain
dc.title 10 nm gap bowtie plasmonic apertures fabricated by modified lift-off process
dc.type Article
dc.type http://purl.org/eprint/type/JournalArticle


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