| dc.contributor |
Chemical Engineering |
|
| dc.creator |
Oyama, Shigeo Ted |
|
| dc.creator |
Aono, Haruki |
|
| dc.creator |
Takagaki, Atsushi |
|
| dc.creator |
Sugawara, Takashi |
|
| dc.creator |
Kikuchi, Ryuji |
|
| dc.date |
2020-03-27T18:47:58Z |
|
| dc.date |
2020-03-27T18:47:58Z |
|
| dc.date |
2020-03-22 |
|
| dc.date |
2020-03-27T13:24:04Z |
|
| dc.date.accessioned |
2023-03-01T18:54:25Z |
|
| dc.date.available |
2023-03-01T18:54:25Z |
|
| dc.identifier |
Oyama, S.T.; Aono, H.; Takagaki, A.; Sugawara, T.; Kikuchi, R. Synthesis of Silica Membranes by Chemical Vapor Deposition Using a Dimethyldimethoxysilane Precursor. Membranes 2020, 10, 50. |
|
| dc.identifier |
http://hdl.handle.net/10919/97499 |
|
| dc.identifier |
https://doi.org/10.3390/membranes10030050 |
|
| dc.identifier.uri |
http://localhost:8080/xmlui/handle/CUHPOERS/281828 |
|
| dc.description |
Silica-based membranes prepared by chemical vapor deposition of tetraethylorthosilicate (TEOS) on γ-alumina overlayers are known to be effective for hydrogen separation and are attractive for membrane reactor applications for hydrogen-producing reactions. In this study, the synthesis of the membranes was improved by simplifying the deposition of the intermediate γ-alumina layers and by using the precursor, dimethyldimethoxysilane (DMDMOS). In the placement of the γ-alumina layers, earlier work in our laboratory employed four to five dipping-calcining cycles of boehmite sol precursors to produce high H<sub>2</sub> selectivities, but this took considerable time. In the present study, only two cycles were needed, even for a macro-porous support, through the use of finer boehmite precursor particle sizes. Using the simplified fabrication process, silica-alumina composite membranes with H<sub>2</sub> permeance > 10<sup>−7</sup> mol m<sup>−2</sup> s<sup>−1</sup> Pa<sup>−1</sup> and H<sub>2</sub>/N<sub>2</sub> selectivity >100 were successfully synthesized. In addition, the use of the silica precursor, DMDMOS, further improved the H<sub>2</sub> permeance without compromising the H<sub>2</sub>/N<sub>2</sub> selectivity. Pure DMDMOS membranes proved to be unstable against hydrothermal conditions, but the addition of aluminum tri-sec-butoxide (ATSB) improved the stability just like for conventional TEOS membranes. |
|
| dc.description |
Published version |
|
| dc.format |
application/pdf |
|
| dc.format |
application/pdf |
|
| dc.language |
en |
|
| dc.publisher |
MDPI |
|
| dc.rights |
Creative Commons Attribution 4.0 International |
|
| dc.rights |
http://creativecommons.org/licenses/by/4.0/ |
|
| dc.subject |
silica-alumina membrane |
|
| dc.subject |
dimethyldimethoxysilane (DMDMOS) |
|
| dc.subject |
hydrothermal stability |
|
| dc.subject |
chemical vapor deposition |
|
| dc.subject |
gamma-alumina intermediate layers |
|
| dc.subject |
hydrogen helium separation |
|
| dc.title |
Synthesis of Silica Membranes by Chemical Vapor Deposition Using a Dimethyldimethoxysilane Precursor |
|
| dc.title |
Membranes |
|
| dc.type |
Article - Refereed |
|
| dc.type |
Text |
|
| dc.type |
StillImage |
|