| dc.contributor |
Applied optics |
|
| dc.creator |
Mellert, Karolin |
|
| dc.date |
2016-06-27T19:03:40Z |
|
| dc.date |
2016-06-27T19:03:40Z |
|
| dc.date |
2002-12 |
|
| dc.date.accessioned |
2023-03-03T07:27:13Z |
|
| dc.date.available |
2023-03-03T07:27:13Z |
|
| dc.identifier |
eprint:275 |
|
| dc.identifier |
http://hdl.handle.net/10919/71551 |
|
| dc.identifier.uri |
http://localhost:8080/xmlui/handle/CUHPOERS/281973 |
|
| dc.description |
Multiple laser beam interference allows to produce periodic light patterns in the order of the wavelength of light. A simulation program helps to identify different patterns and to investigate the influence of changing parameters such as e.g. the angle of incidence or the polarization. A positive photoresist (Shipley S1805) is used to create two-dimensional metallic photonic crystals by UV interference lithography. |
|
| dc.format |
application/pdf |
|
| dc.format |
application/pdf |
|
| dc.language |
de |
|
| dc.publisher |
Rheinische Friedrich-Wilhelms-Universität Bonn |
|
| dc.rights |
In Copyright |
|
| dc.rights |
http://rightsstatements.org/vocab/InC/1.0/ |
|
| dc.subject |
photonic crystal |
|
| dc.subject |
interference |
|
| dc.subject |
lithography |
|
| dc.subject |
Simulation |
|
| dc.subject |
metal |
|
| dc.subject |
gold |
|
| dc.subject |
plasmon |
|
| dc.subject |
S1805 |
|
| dc.subject |
Shipley |
|
| dc.subject |
positive photoresist |
|
| dc.subject |
QC |
|
| dc.title |
Aufbau einer Interferenzlithografie-Anlage zur Herstellung photonischer Kristalle |
|
| dc.type |
Thesis |
|